CVD SiC Focus Rings

Quantity:
Contact Now
add to cart
CVD SiC Focus Rings
Semicorex CVD SiC focus rings, the indispensable ring parts used in the high-precision etching process, are precisely fabricated from high-performance CVD SiC materials. Choosing Semicorex CVD SiC focus rings means that you will obtain the ideal CVD SiC etching solutions to achieve optimal etching results.

Focus rings are critical consumable components in semiconductor manufacturing, and they will be gradually consumed and thinned by plasma during etching process. As integrated circuits become more miniaturized, the etching process has grown increasingly vital, with plasma power and energy continuously elevated. Especially within capacitive coupled plasma (CCP) etch equipment featuring higher plasma energy, conventional quartz and silicon focus rings fail to satisfy application requirements. For this reason, focus rings fabricated from CVD SiC are being increasingly adopted.

Material properties of CVD SiC material

1.High material purity

2.High density and High hardness

3.Stable thermal stability

4.Excellent plasma erosion resistance

5.Superior electrical characteristics

Functions of Semicorex CVD SiC focus rings

1.Concentrate plasma and ensure uniform etching

Since the etching process exhibits an inevitable edge effect, plasma density at the center of the etching chamber is usually higher than at the edge. Semicorex CVD SiC focus rings can direct and focus plasma to distribute uniformly across the wafer surface, which thereby effectively ensures a highly consistent etch rate from the center to the edge of the wafer and guarantees uniform etching over the entire wafer.

2.Protect other components and lower contamination risks

High-energy plasma bombardment has strong erosive behavior. Semicorex CVD SiC focus rings can significantly prevent plasma from directly attacking the etching chamber wall and electrostatic chuck. This greatly extends the service of core components used in etching equipment and minimizes particle shedding and process byproducts that cause chamber contamination.

3.Compensate edge height differences and optimize electric field distribution

Semicorex CVD SiC focus rings can maintain a same distance between the upper electrode and the wafer surface as well as the focus ring surface by compensating for the height difference between the electrode and the wafer edge. This can reduce electric field distortion brought on by height variations and help create a uniform electric field distribution.