Fused Quartz Tube

Semicorex Fused Quartz Tubes are indispensable components in the precise and demanding processes of semiconductor manufacturing, specifically in oxidation and diffusion. These tubes are crafted from high-purity quartz, offering exceptional thermal stability, chemical resistance, and optical clarity to meet the rigorous requirements of modern semiconductor fabrication.

High Purity and Stability
The Fused Quartz Tube is manufactured from ultra-high-purity quartz materials, ensuring minimal contamination and maintaining the integrity of semiconductor wafers. This purity is critical in oxidation and diffusion processes, where even trace impurities can compromise the performance of the final semiconductor device.
Excellent Thermal Properties
With superior thermal stability and low thermal expansion, the tube can withstand extreme temperatures of up to 1200°C or higher without deformation or cracking. This ensures reliable operation in high-temperature environments, essential for oxidation and diffusion.
Outstanding Chemical Resistance
The inert nature of quartz provides excellent resistance to chemical reactions during exposure to high-purity gases such as oxygen, nitrogen, and dopant sources. This durability enhances the lifespan of the tube and reduces the frequency of replacements, minimizing downtime.
Dimensional Precision and Customization
The Fused Quartz Tube is engineered with precise dimensional tolerances to ensure uniform gas flow and thermal distribution. Customization options, including variations in length, diameter, and wall thickness, are available to meet specific reactor configurations and process requirements.
Low Optical Absorption
The tube’s low optical absorption properties reduce energy loss and allow for efficient heat and light transmission during thermal processes, optimizing energy consumption and improving overall process efficiency.

 

Fused Quartz Tubes are pivotal in two primary stages of semiconductor manufacturing: oxidation and diffusion.
1. Oxidation Process
During oxidation, a thin layer of silicon dioxide (SiO₂) is grown on the wafer surface to act as an insulating layer. The high-purity and thermal stability of the Fused Quartz Tube ensure a uniform and defect-free oxide layer. This precision contributes to the electrical performance of the final semiconductor device.
The tube’s smooth surface minimizes particle generation and contamination risks, crucial for maintaining the wafer's pristine condition. Its chemical inertness ensures compatibility with the high-purity oxygen used in the oxidation process.
2. Diffusion Process
In diffusion, dopants such as boron or phosphorus are introduced to alter the electrical properties of the silicon wafer. The Fused Quartz Tube’s excellent thermal and chemical resistance supports consistent dopant distribution and controlled diffusion depth.
Quartz’s resistance to the reactive chemicals used during diffusion prevents unwanted interactions that could alter the doping profile, ensuring high yield and device reliability.

 

To address diverse customer needs, our Fused Quartz Tubes are available in standard and bespoke designs. Our advanced manufacturing processes and rigorous quality control ensure that every tube meets stringent semiconductor industry standards. Each product undergoes comprehensive testing to verify thermal and chemical stability, dimensional accuracy, and purity.

Our Fused Quartz Tubes deliver unparalleled performance in semiconductor oxidation and diffusion processes. With a commitment to quality and innovation, we provide solutions that enhance efficiency, precision, and reliability for our customers. Trust our expertise to meet the challenges of semiconductor manufacturing and achieve the highest levels of production excellence.