Quartz Pedestal

In the demanding world of semiconductor manufacturing, achieving consistent and high-quality results in oxidation, diffusion, and Chemical Vapor Deposition (CVD) processes hinges on the reliability and purity of your equipment components. Semicorex Quartz Pedestal stands as a critical element within these high-temperature environments, providing essential support and ensuring optimal process uniformity. Crafted from premium-grade fused quartz, our Quartz Pedestals are engineered to meet the stringent requirements of advanced semiconductor fabrication, offering exceptional thermal stability, chemical inertness, and dimensional precision.

The main purpose of diffusion is to dope semiconductor wafers under high temperature conditions, that is, to diffuse the elements phosphorus and boron into silicon wafers, thereby changing and controlling the type, concentration and distribution of impurities in the semiconductor, so as to establish different electrical characteristic regions. Using different doping processes, P-type semiconductors and N-type semiconductors are made on the same semiconductor silicon wafer through diffusion. Diffusion in semiconductors belongs to mass transfer among the three transport phenomena (mass transfer, heat transfer and momentum transfer), and the effect is only obvious in a high temperature environment above 850°C; while the diffusion, oxidation and annealing processes of the horizontal furnace require special quartz materials that can maintain temperature stability even in a high temperature environment (>1150°C).

At the heart of our Quartz Pedestal lies the use of high-purity fused quartz. This exceptional material boasts an inherently low metallic impurity content, minimizing the risk of contamination that can compromise delicate wafer surfaces and device performance. Its remarkable resistance to chemical attack from aggressive process gases and high temperatures ensures a long service life and consistent performance across numerous process cycles. This purity translates directly into higher yields and more reliable device fabrication.

Oxidation, diffusion, and CVD processes typically take place at very high temperatures and involve rapid thermal cycling. Conditions that our Quartz Pedestals are made to endure. Fused quartz has a low coefficient of thermal expansion so that under such extreme heat, dimensional changes and warping are minimized, ensuring consistent wafer placement as well as optimal heat transfer material. This stability is most important for achieving uniform distribution of temperature across the wafer surface since it will translate directly into better film thickness uniformity and dopant diffusion profiles.

Knowing different needs of other reactor designs, our Quartz Pedestals come in many customizable setups. Whether you need pedestals of certain sizes, complex shapes for special uses, or attributes for better gas flow, our engineering group can make a solution fit perfectly with your current tools. This precision design ensures optimal wafer support, prevents unwanted vibrations, and facilitates efficient gas distribution for uniform processing.